Cymer Begins Shipping XL-100 Sources
Excimer laser supplier Cymer Inc. said today it has shipped its first XLA 100 argon fluoride (ArF) light source to a lithography system supplier on February 1.
The XLA 100 light source is the first product in Cymer's XL Series of light sources based on its proprietary master oscillator
Cymer also reported that it has received orders for the XLA 100 light source from the three principle lithography tool suppliers, ASML, Canon and Nikon, for use in 193nm tools. Delivery of the sources is slated for the current quarter.
Cymer's MOPA-based technology will serve as a common platform for the company's future light sources spanning all three deep ultraviolet wavelengths, 248nm, 193nm and 157nm. Employing this common platform has allowed the company to reduce consumables costs, simplified system servicing and given it the ability to mix and match ArF and krypton fluoride light sources within the same manufacturing environment, Cymer said.
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