Multimedia Available: Applied Materials Announces Revolutionary Fixed-Abrasive CMP Solution.

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--(BUSINESS WIRE)

Applied Materials Inc. today introduced its revolutionary

new Reflexion Fixed-Abrasive Web(tm) CMP (chemical mechanical planarization) system with a unique slurryless process for forming the STI (shallow trench isolation) structures in sub-100nm devices. The system sets a new benchmark for STI planarization by virtually eliminating "dishing" and "erosion" effects that can limit device performance and yield.

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