JSR develops exposure fluid for chipmaking lasers.(Electronics)

JSR Corporation has developed a fluid that can be used with existing argon fluoride (ArF) lasers to create semiconductor circuits with 32 nm line widths.

The fluid is used in a next-generation circuit exposure technology known as fluid immersion exposure, which entails a fluid occupying the space between a stepper's lens and the semiconductor wafer to increase resolution.

Water, with a refractive index of 1.44, has been considered the ideal fluid for this method. But JSR's fluid has a refractive index of 1.64, and can produce finer circuit line widt